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iM Advanced Materials

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Roll to roll Photolithography

Our etching technology is based on photolithographic technology developed for the semiconductor manufacturing process.
Our accumulated knowledge gives us processing advantages in these areas in terms of speed, volume and precision.

Photolithography Specification

Metal Thickness Line Width Line Space
5㎛~ Min. 10㎛ Min. 10㎛
10㎛~ Min. 15㎛ Min. 15㎛
30㎛~ Min. 30㎛ Min. 30㎛