Our etching technology is based on photolithographic technology developed for the semiconductor manufacturing process.
Our accumulated knowledge gives us processing advantages in these areas in terms of speed, volume and precision.
Metal Thickness | Line Width | Line Space |
---|---|---|
5㎛~ | Min. 10㎛ | Min. 10㎛ |
10㎛~ | Min. 15㎛ | Min. 15㎛ |
30㎛~ | Min. 30㎛ | Min. 30㎛ |