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iM Advanced Materials

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Nano Metal Coating

Roll To Roll Deposition System

For thin film coating, we use an electric field coupled plasma enhanced chemical vapor (PECVD) deposition at room temperature. More specifically, it is a single system which forms ions by electron cyclotron resonance (ECR) plasma and it forms metal ions by supplying an organometallic compound precursor to a lower end of the ions, thereby being deposited by chemically bonding the metal ions to a substrate. Depending on the purpose, the structure of thin film can be single or multi-layer.

This method is physical vapor deposition. Reactive gases and electric power are supplied to the target, and energy particles collide with the target surface through a glow discharge.
Then, the particles are deposited on the surface to form a thin film attached to the substrate.

Sputtering

Roll To Roll Deposition System (This is under development.)